Lectra Investronica Pgs-mgs-mtm V11r2 - Samo Na...

Superior nesting capabilities directly result in lower fabric costs.

Once installed and stabilized, v11R2 runs indefinitely without monthly licensing fees.

In a landmark move, the French multinational Lectra acquired Investronica Sistemas in 2004 for $65.4 million. This strategic acquisition was aimed at strengthening Lectra's global leadership in integrated technology solutions for the textile and fashion industries. Under Lectra, the innovative technologies of Investronica were integrated into a broader portfolio, continuing to be developed and supported as industry standards. Lectra Investronica PGS-MGS-MTM v11R2 - samo na...

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Used for generating markers for optimized cutting.

Modern iterations of the Investronica suite, such as Invesmark Futura , include 3D simulation capabilities to visualize garments before physical samples are cut. MGS (Marker Generation System)

| User Role | How They Use the Software | Key Benefit | |---|---|---| | | Creates and grades digital patterns in PGS module | Consistent quality across all sizes and shapes | | Marker Maker | Uses MGS to perform automated fabric nesting | Maximizes material yield and reduces waste | | Production Manager | Uses MTM to automatically generate patterns from customer data | Speeds up delivery and reduces inventory costs | | Cutting Room Operator | Receives marker files directly from MGS and loads them onto the cutting system | Faster, more efficient cutting process |

Designed to handle custom orders without significantly reducing productivity, a crucial feature for on-demand fashion. 3. Why v11R2? (The "Samo na..." Difference)

The is a specialized Computer-Aided Design (CAD) software suite designed for the fashion and apparel industry. It focuses on automating and streamlining the transition from design to manufacturing through three primary modules: Pattern Generation System (PGS) , Marker Generation System (MGS) , and Made-to-Measure (MTM) . Core Functional Modules

The system processes exact curve definitions, seam allowances, and notches natively, reducing physical sample prototyping requirements. 2. MGS (Marker Generation System)